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碳化硅CVI/CVD沉积炉

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碳化硅CVI/CVD沉积炉技术特征
电阻炉可采用多温区独立控温,温度均匀性好;

采用智能压力调控,压力波动小;

全封闭沉积室,密封效果好,抗污染能力强;

多通道工艺气路,流场均匀,无沉积死角,沉积效果好;

多级高效尾气处理系统,环境友好,易清理;

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